Advanced Certificate in Nanolithography Pattern Transfer Methods
-- ViewingNowThe Advanced Certificate in Nanolithography Pattern Transfer Methods is a comprehensive course that provides learners with in-depth knowledge and skills in nanolithography, a critical technology in the production of nanoscale devices. This course is essential for professionals seeking to advance their careers in the high-technology industry, where nanolithography is used in various applications such as semiconductor manufacturing, data storage, and biomedical devices.
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โข Introduction to Nanolithography Pattern Transfer Methods: Fundamentals, principles, and applications of nanolithography in modern technology.
โข Extreme Ultraviolet (EUV) Lithography: EUV sources, optics, resists, and pellicles, as well as resist processing and mask infrastructure.
โข Immersion Lithography: Wet cleaning, photoresist coating, exposure, development, and post-exposure bake processes.
โข Nanopatterning Techniques: Electron beam lithography (EBL), nanoimprint lithography (NIL), and laser interference lithography (LIL).
โข Advanced Mask Technologies: Attenuated phase shift masks (AttPSM), binary intensity masks (BIN), and source mask optimization (SMO).
โข Direct-write Nanolithography: Scanning probe lithography (SPL), focused ion beam (FIB) lithography, and multi-beam lithography.
โข Materials and Processes for Nanolithography: Photoresists, hard masks, etch processes, and deposition techniques.
โข Metrology and Inspection: Critical dimension (CD) metrology, overlay metrology, and defect inspection for nanolithography.
โข Nanolithography for Nanoelectronics: Scaling challenges, device structures, and advanced node integration.
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