Executive Development Programme in Nanolithography Implementation

• Fundamentals of Nanolithography: An overview of the basic concepts, principles, and techniques in Nanolithography. This unit will cover the history, current state, and future potential of Nanolithography. It will also introduce the various types of Nanolithography, including optical, electron-beam, and scanning probe lithography.
• Nanolithography Equipment and Tools: This unit will focus on the different equipment and tools used in Nanolithography, including lithography systems, masks, and resists. It will also cover the latest advancements in Nanolithography technology and their potential impact on the industry.
• Design and Simulation of Nanostructures: This unit will teach participants how to design and simulate Nanostructures using computer-aided design (CAD) software. It will cover the various design parameters, such as feature size, aspect ratio, and pitch, and how they affect the performance of Nanostructures.
• Fabrication of Nanostructures: This unit will cover the different fabrication techniques used in Nanolithography, including photolithography, electron-beam lithography, and scanning probe lithography. It will also cover the various materials used in Nanostructure fabrication, including metals, semiconductors, and polymers.
• Characterization and Metrology of Nanostructures: This unit will focus on the characterization and metrology of Nanostructures, including the use of scanning electron microscopy (SEM), transmission electron microscopy (TEM), and atomic force microscopy (AFM). It will also cover the various measurement parameters, such as critical dimension (CD), overlay, and defectivity.
• Advanced Nanolithography Techniques: This unit will cover advanced Nanolithography techniques, including directed self-assembly (DSA), extreme ultraviolet lithography (EUVL), and nanoimprint lithography (N